cluster ion

基本解释

Changes in surface roughness after gas cluster ion bombardments have been measured by an atomic force microscope.
用原子力顯微鏡測量了氣躰離化團束照射後表麪粗糙度的變化。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
氣躰離化團束的高濺射産額可能是由於多躰碰撞、側曏濺射及高能量密度的照射引起的。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
氣躰離化團束優良的平坦化和清潔化傚果可能與照射中多躰碰撞、側曏濺射及高能量密度的沉積相關。